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Item Details
| Title:
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FROM GEOMETRIC MODELING TO SHAPE MODELING
IFIP TC5 WG5.2 SEVENTH WORKSHOP ON GEOMETRIC MODELING: FUNDAMENTALS AND APPLICATIONS OCTOBER 2-4, 2000, PARMA, ITALY |
| By: |
Umberto Cugini (Editor), Michael J. Wozny (Editor) |
| Format: |
Paperback |
| List price:
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£142.50 |
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We currently do not stock this item, please contact the publisher directly for
further information.
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| ISBN 10: |
1475752814 |
| ISBN 13: |
9781475752816 |
| Publisher: |
SPRINGER-VERLAG NEW YORK INC. |
| Pub. date: |
27 February, 2013 |
| Edition: |
Softcover reprint of the original 1st ed. 2002 |
| Series: |
IFIP Advances in Information and Communication Technology 80 |
| Pages: |
240 |
| Synopsis: |
IFIP Working Group 5.2 has organized a series of workshops aimed at presenting and discussing current issues and future perspectives of Geometric Modeling in the CAD environment. From Geometric Modeling to Shape Modeling comprises the proceedings of the seventh GEO workshop, which was sponsored by the International Federation for Information Processing (IFIP) and held in Parma, Italy in October 2000. The workshop looked at new paradigms for CAD including the evolution of geometric-centric CAD systems, modeling of non-rigid materials, shape modeling, geometric modeling and virtual prototyping, and new methods of interaction with geometric models. The seventeen included papers provide an interesting overview of the evolution of geometric centric modeling into shape modeling. Also included is an invited speaker paper, which discusses the foundation of the next generation of CAD systems, where shape and function enhance geometric descriptions. The main topics discussed in the book are: Theoretical foundation for solids and surfaces; Computational basis for geometric modeling; Methods of interaction with geometric models; Industrial and other applications of geometric modeling; New paradigms of geometric modeling for CAD; Shape modeling. From Geometric Modeling to Shape Modeling is essential reading for researchers, graduate and postgraduate students, systems developers of advanced computer-aided design and manufacturing systems, and engineers involved in industrial applications. |
| Illustrations: |
X, 240 p. |
| Publication: |
US |
| Imprint: |
Springer-Verlag New York Inc. |
| Returns: |
Returnable |
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