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Item Details
Title: THE CHEMISTRY OF METAL CVD
By: Toivo T. Kodas, Mark J. Hampden-Smith
Format: Electronic book text

List price: £138.00


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ISBN 10: 3527615849
ISBN 13: 9783527615841
Publisher: JOHN WILEY AND SONS LTD
Pub. date: 26 September, 2008
Pages: 562
Synopsis: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Publication: UK
Imprint: Wiley-VCH Verlag GmbH
Returns: Non-returnable
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