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Title: CHEMICAL-MECHANICAL POLISHING - FUNDAMENTALS AND CHALLENGES: VOLUME 566
By: Suryadevara V. Babu (Editor), S. Danyluk (Editor), M. Krishnan (Editor)
Format: Paperback

List price: £22.00


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ISBN 10: 1107414024
ISBN 13: 9781107414020
Publisher: CAMBRIDGE UNIVERSITY PRESS
Pub. date: 5 June, 2014
Series: MRS Proceedings
Pages: 296
Description: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Synopsis: Chemical-mechanical planarization (CMP) has emerged over the past few years as a key enabling technology in the relentless drive of the semiconductor industry towards smaller, faster and less expensive interconnects. However, there are still many gaps in the fundamental understanding of the overall CMP process and the associated defect and contamination issues. This book brings together many of the active players in the field to focus on the interdisciplinary nature of these challenges. It reflects, to some extent, the role played by both academic institutions and multinational corporations in opening up the frontiers in the field of CMP for wider dissemination. Both experimental and theoretical contributions are included. Topics include: overview and oxide polishing; pads and related issues; metal polishing - W and Al; copper polishing and related issues; CMP modeling and fluid flow; and particle adhesion and post-polish cleaning.
Illustrations: black & white illustrations
Publication: UK
Imprint: Cambridge University Press
Returns: Returnable
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