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Item Details
Title: ATOMIC LAYER DEPOSITION
PRINCIPLES, CHARACTERISTICS, AND NANOTECHNOLOGY APPLICATONS
By: Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen
Format: Hardback

List price: £174.95
Our price: £157.46
Discount:
10% off
You save: £17.49
ISBN 10: 1118062779
ISBN 13: 9781118062777
Availability: Usually dispatched within 1-3 weeks.
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Stock: Currently 0 available
Publisher: JOHN WILEY & SONS INC
Pub. date: 28 May, 2013
Edition: 2nd Revised edition
Pages: 272
Description: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
Synopsis: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Illustrations: Illustrations
Publication: US
Imprint: John Wiley & Sons Inc
Returns: Returnable
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